Exhaust Management Systems

  • Zenith

    ZENITH: Combined Vacuum and Exhaust Management Systems

    The Zenith range is a ground breaking series of process-specific combined vacuum and exhaust management systems, providing enhanced safety, process tool compatibility, minimum footprint and reduced cost of ownership. Developed in cooperation with the OEMs to assure appropriate pumping and abatement solutions, a centralized control strategy allows for energy conservation through Active Utility Control. As a single extracted cabinet with single utility connection Zenith represents the most cost-effective method of providing protection in the event of leakage as only one extraction connection is required compared to multiple enclosures.

  • Atlas

    ATLAS™: Combustion Gas Abatement

    Atlas™ from Edwards: the range of combustion gas abatement solutions that offers semiconductor manufacturers reduced operating costs and enhanced ease-of-use. Atlas™ systems have low fuel consumption compared with previous-generation gas abatement devices and utilize proven Alzeta™ inward-fired combustor technology to achieve significantly reduced costs of ownership. With one to six inlets with a number of options, including a temperature management system (TMS), they can reach a flow capacity of up to 600 slm and they offer enhanced ease-of-use and more efficient maintenance.

  • HOx

    HOx: Hot Oxidation System

    The Hot Oxidation System (HOx) offers a significant advance in the performance of non-fuel oxidation technology. Targeted at CVD applications, the system ensures safe removal of pyrophoric gases to below flammable limits and the effective treatment of acidic by-products to prevent exhaust duct corrosion. The HOx combines an innovative electrical heated oxidation unit with the proven three-stage wet scrubber from the inward-fired combustor product range to deliver excellent powder handling capabilities.

  • Mistral

    MISTRAL: Hot Air Oxidation Unit

    Mistral is an electrically-heated hot air oxidation unit coupled with a proven three-stage wet scrubber and self-cleaning inlets. Mistral employs a patented hydrogen inject system and is capable of removing pyrophoric and acid gases) for semiconductor applications such as polysilicon and oxide deposition as well as the high fluorine flows from processes that employ remote nitrogen trifluoride (NF3) clean

  • Spectra

    SPECTRA: High Performance Exhaust Treatment

    The Spectra series is a cost effective, reliable, high performance exhaust treatment solution for the latest generation Flat Panel Display (FPD), Solar and MOCVD manufacturing processes. The Spectra-G is a cost-effective, high performance exhaust treatment solution for nitride MOCVD manufacturing. The Spectra-Z system is a cost effective, reliable, high performance exhaust treatment solution for the latest generation Flat Panel Display (FPD) and Solar Cell manufacturing processes.

  • GRC

    GRC: Dry Abatement Systems

    Edwards offers a range of low-cost, point of use dry abatement systems for semiconductor processing. Each system uses the unique hot bed reactor technology developed for the GRC (Gas Reactor Column) range. The Edwards GaNcat treats the significant ammonia flows present in the exhausts of nitride-based MOCVD processes by decomposing this gas into its constituent elements, nitrogen and hydrogen, using a heated dry cartridge technology. At the same time, it eliminates the possibility of contamination of the cartridge by the metalorganic gases that are also present, such as TMG, TMI and TMA. This is achieved without the need for external traps by the inclusion of a special pre-cleaning stage in the first portion of the cartridge that results in the formation of stable inorganic solids.

  • Tempest

    TEMPEST: Point-of-use Water Absorption Scrubbers

    Edwards offers point-of-use water absorption scrubbers. Systems are suitable for the treatment of exhaust streams containing water-soluble and water-reactive gases. Edwards’ Tempest offers exhaust management at minimal cost for preservation of assets and regulatory compliance. The Tempest is suitable for treatment of exhaust streams containing water-soluble and water-reactive gases. Tempest is suitable for many processes including Metal Etch, Poly Etch, LPCVD Nitride, PECVD Nitride and RTP.

  • Sirius

    SIRIUS: Plasma Exhaust Management

    Designed for low cost-of-ownership, the Sirius 6000 system addresses greenhouse gas abatement challenges arising from dielectric and polysilicon etch processes used in semiconductor manufacturing. The design uses an energy efficient microwave plasma in a carefully controlled chemical environment and an integrated wet scrubber to reduce fab greenhouse gas emissions by as much as 95 percent over a wide range of total flow rates and perfluorocompound (PFC) concentrations.

  • PCS

    PCS: Pyrophoric Conditioning System

    The Pyrophoric Conditioning System (PCS) sets a new standard for self oxidation systems using the pyrophoric properties of gases for exhaust control. The self oxidation concept is a low cost approach for the silane exhausts used in many fabs worldwide. The PCS makes exhaust flows of silane with excess air and uses the natural pyrophoric properties of the gas to ensure oxidation. The PCS incorporates design features to alleviate blockage associated with oxidation of high silane flows. In laboratory tests on simulated process flows, silane oxidation observations show that, at concentrations of silane in nitrogen > 1.6% self oxidation occurs on mixing with air.

  • WESP

    WESP: Wet Electro-static Precipitator

    Edwards offers the WESP (Wet Electro-static Precipitator) for the efficient removal of particles downstream of a process chamber abatement device. The system transfers the particles into a water stream without generating significant backpressure, and can be used in conjunction with most abatement devices. Efficient removal of particles from semiconductor process exhausts minimizes the risk of blockages in exhaust ducts. WESP is well-suited for 300 mm CVD, FPD, Solar Cell and MOCVD processes.

  • WCT

    WCT: Water Cooled Exhaust Trap

    LPCVD nitride processes using dichlorosilane (SiH2Cl2) and ammonia (NH3) generate ammonium chloride (NH4Cl). On cooling, at atmospheric pressure, NH4Cl rapidly condenses out as a solid in the exhaust lines causing blockages. The water cooled trap provides a cost-effective solution for controlled deposition of these solid by-products. Both the trap and the liner are water-cooled so NH4Cl is deposited on the liner. The liner has a large capacity and is quick and easy to change.

  • TMS

    TMS: Temperature Management System

    Edwards offers (Temperature Management System) for processes involving condensable solids. TMS ensures that these compounds remain volatile until they enter abatement device. The TMS is designed to heat both forelines and pump exhaust lines to the inlet of the abatement device. Moulded high surface area heaters maximize contact with pipes and are designed to maintain the temperature of the pipe between 90° and 150°C.